Please use this identifier to cite or link to this item: https://dspace.uzhnu.edu.ua/jspui/handle/lib/45370
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dc.contributor.authorShuaibov, O.K.-
dc.contributor.authorMinyа, O.Y.-
dc.contributor.authorHrytsak, R.V.-
dc.contributor.authorMalinina, A.O.-
dc.contributor.authorHomoki, Z.T.-
dc.date.accessioned2022-10-28T07:06:06Z-
dc.date.available2022-10-28T07:06:06Z-
dc.date.issued2022-09-
dc.identifier.citationO.K. Shuaibov, O.Y. Minya, R.V. Hrytsak, A.O. Malinina, Z.T. Homoki PHYSICS AND CHEMISTRY OF SOLID STATE V. 23, No. 3 (2022) pp. 491-496uk
dc.identifier.urihttps://dspace.uzhnu.edu.ua/jspui/handle/lib/45370-
dc.description.abstractThe results of studying the characteristics of a low-pressure high-frequency discharge in air (p = 10 Pa) for the synthesis of thin films from silver nitride, due to the electron sputtering mechanism of a polycrystalline electrode from the compound Ag2S, are presented. For the synthesis of thin films based on the AgNO3 compound, the phenomenon of explosive emission of natural inhomogeneities on the surface of a polycrystalline electrode was used, in which, as a result of the destruction of electrodes from the Ag2S superionic conductor, a silver vapor flow was formed, which, after interaction with a low-density air plasma, condensed in the form of silver nitride on placed near a dielectric substrate. The resulting films can be used in medicine, biotechnology, biomedical engineering, and agriculture.uk
dc.language.isoenuk
dc.subjecthigh-frequency dischargeuk
dc.subjectthin filmsuk
dc.subjectsilver nitrideuk
dc.subjectradiation spectrumuk
dc.subjectplasmauk
dc.titleInvestigation of conditions of synthesis of thin films of silver nitride (AgNO3) in a high-frequency low-pressure dischargeuk
dc.typeTextuk
dc.pubTypeСтаттяuk
Appears in Collections:Наукові публікації кафедри квантової електроніки

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