Plasma Reactor Generating Synchronous Flows of Bactericidal UV Radiation and Nanostructures of Zinc, Copper, Iron Oxides and Chalcopyrite

Abstract

The characteristics of a plasma-chemical reactor based on an overstressed nanosecond discharge in atmospheric pressure gases (air, nitrogen, helium, argon) between electrodes of zinc, copper and iron, as well as of chalcopyrite (CuInSe2) at a distance between the electrodes of 1-3 mm are given. It was established that this discharge is a point source of ultraviolet radiation in the spectral range of 200-300 nm and a flow of transition metal oxide nanoparticles (Zn, Cu, Fe), as well as chalcopyrite nanoparticles. The results of the optimization of a UV emitter depending on the pumping conditions and parameters of the discharge medium, as well as the optical characteristics of film nanostructures of transition metal oxides and chalcopyrite deposited on the surface of a glass substrate, are presented.