Будь ласка, використовуйте цей ідентифікатор, щоб цитувати або посилатися на цей матеріал: https://dspace.uzhnu.edu.ua/jspui/handle/lib/74614
Назва: MATHEMATICAL MODELING IN NATURAL SCIENCES AND INFORMATION TECHNOLOGIES
Інші назви: МАТЕМАТИЧНЕ МОДЕЛЮВАННЯ В ПРИРОДНИЧИХ НАУКАХ ТА ІНФОРМАЦІЙНІ ТЕХНОЛОГІЇ
Автори: Bilak, Yurii
Shuaibov, Oleksandr
Buchuk, Roman
Rol, Mariana
Buletsa, Roman
Ключові слова: Monte Carlo, modeling, spectrum, nanomaterials, python
Дата публікації: 2025
Видавництво: Математичне моделювання
Бібліографічний опис: Математичне моделювання № 1(52) 2025 DOI: 10.31319/2519-8106.1(52)2025.323659
Короткий огляд (реферат): The article discusses the use of the Monte Carlo method for numerical modeling of plasma processes in overvoltage nanosecond discharges. The principle of the method, its algorithm, and key aspects of the software implementation are described in detail, in particular, the use of Python using the NumPy and SciPy libraries to model particle trajectories, collision probabilities, and energy distri-butions. The main goal of the work was to study plasma parameters, such as the electron energy distri-bution function (EEDF), electron temperature, plasma density, and optical characteristics, including spectral dependences of radiation. The work analyzed the behavior of electrons in gas mixtures under various conditions, including changes in the electric field E/N and pressure. The simulation results showed a high correlation with experimental data, confirming the effectiveness of the Monte Carlo method for analyzing microscopic processes in plasma. The study includes an analysis of alternative plasma modeling methods, such as magnetohydrodynamic models, models based on the Boltzmann equation (BOLSIG+), and hybrid approaches. The development of a numerical model of plasma pro-cesses is important in the context of the rapid development of computing technology, which allows per-forming complex calculations with high accuracy. This opens up new opportunities for the application of plasma technologies in industry, including the development of energy-efficient devices and innovative materials. Thus, the work has both fundamental and applied significance, contributing to the solution of urgent problems of modern science and technology. The practical significance of the work lies in the application of the results to create thin films, in particular chalcopyrites, in photovoltaic devices. Plasma modeling in overvoltage discharges shows significant potential for optimizing the synthesis conditions of nanomaterials with controlled properties. In the future, the proposed model can be adapted for additional tasks, including the influence of a mag-netic field and the analysis of spectral characteristics. The results of the work confirm the importance of numerical modeling for the study of plasma processes and their further use in high-tech applications, in particular for the development of plasma methods for the synthesis of nanomaterials.
Тип: Text
Тип публікації: Стаття
URI (Уніфікований ідентифікатор ресурсу): https://dspace.uzhnu.edu.ua/jspui/handle/lib/74614
Розташовується у зібраннях:Навчально-методичні видання кафедри прикладної фізики і квантової електроніки

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