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https://dspace.uzhnu.edu.ua/jspui/handle/lib/69522
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DC Field | Value | Language |
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dc.contributor.author | Bilanych, B.V. | - |
dc.contributor.author | Shylenko, O. | - |
dc.contributor.author | Latyshev, V.M. | - |
dc.contributor.author | Feher, A. | - |
dc.contributor.author | Bilanych, V.S. | - |
dc.contributor.author | Rizak, V.M. | - |
dc.contributor.author | Komanicky, V. | - |
dc.date.accessioned | 2025-01-18T22:00:36Z | - |
dc.date.available | 2025-01-18T22:00:36Z | - |
dc.date.issued | 2020 | - |
dc.identifier.citation | Ukr. J. Phys. 2020. Vol. 65, No. 3, p.247-253 | uk |
dc.identifier.uri | https://dspace.uzhnu.edu.ua/jspui/handle/lib/69522 | - |
dc.description.abstract | The interaction of an electron beam with chalcogenide films As4Se96 has been studied. The kinetics of the formation of an electron-induced surface relief in the dose range 9.3 × 103–9.3×107 𝜇C· cm−2 is established. The parameters of the interaction of a film As4Se96 with an electron beam are calculated. It is shown that the observed point of inversion of the shape of the electron-induced relief can be caused by the crossover of the surface potential. The process of manufacturing the image element by the single-step lithography is realized on the surface of an As4Se96 film. | uk |
dc.description.sponsorship | This work has been supported the grant of the Slovak Research and Development Agency under the contract No. APVV-17-0059. The author Bogdan Bilanych is grateful to a grant of National Scholarship Programme of the Slovak Republic SAIA for the financial help in the realization of this research. | uk |
dc.language.iso | en | uk |
dc.publisher | Ukr. J. Phys. | uk |
dc.subject | electron-induced surface relief | uk |
dc.subject | chalcogenide glass, thin films, As–Se, electron-induced surface relief. | uk |
dc.title | Interaction of chalcogenide As4Se96 films with electron beam when used them as electronic resists | uk |
dc.type | Text | uk |
dc.pubType | Стаття | uk |
Appears in Collections: | Наукові публікації кафедри прикладної фізики і квантової електроніки |
Files in This Item:
File | Description | Size | Format | |
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2020Bilanych_UJP-As4Se96.pdf | 852.78 kB | Adobe PDF | View/Open |
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